Abstract
Ga-doped ZnO (GZO) thin films were grown on LaAlO3 (LAO) and SrTiO3 (STO) substrates by using a pulsed laser deposition (PLD) technique at various substrate temperatures. It was found that the nonpolar a-plane GZO thin films were grown on LAO (1 0 0) substrates. However, the polar c-plane or the c-plane coexistent with the a-plane GZO films were obtained on STO (1 0 0) substrates. The in-plane orientational relationship between the GZO films and substrates was also investigated. The electrical properties of the films were deeply affected by the growth orientation. The GZO films with a-axis oriented phase showed higher resistivity than with c-oriented phase, which can be ascribed to the lower mobility due to the increase in grain boundary scattering.
Original language | English |
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Pages (from-to) | 72-75 |
Number of pages | 4 |
Journal | Journal of Crystal Growth |
Volume | 334 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2011 Nov 1 |
Keywords
- A1. Atomic force microscopy
- A1. Hall measurement
- A1. High resolution X-ray diffraction
- A3. Pulsed laser deposition
- B1. Ga-doped ZnO
- B2. Semiconducting IIVI materials
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry