Abstract
Applying a molecular dynamics simulation technique with the Tersoff potential, we investigate the isothermal crystallization processes of amorphous silicon (a-Si). To obtain a realistic amorphous structure, a rapid quenching process from liquid-phase at 3500 K to solid-phase at 500 K is simulated at a rate of 1012 K/s and the Voronoi analysis is conducted to observe atomic structural changes during this cooling process. This amorphous structure is utilized to simulate the crystallization processes at various process temperatures with and without external force fields. While homogeneous crystallization of a-Si could not be achieved readily, it is shown that the heterogeneous crystallization can be significantly accelerated by external force fields. This enhancement is owing to increased molecular jumping frequencies associated with the molecular potential energies being increased by external excitations, rather than due to thermal mechanisms normally found in conventional solid-phase crystallization processes.
Original language | English |
---|---|
Pages (from-to) | 205-215 |
Number of pages | 11 |
Journal | Superlattices and Microstructures |
Volume | 35 |
Issue number | 3-6 |
DOIs | |
Publication status | Published - 2004 Mar |
Event | Eurotherm 75: Microscale Heat Transfer 2 - Reims, France Duration: 2003 Jul 8 → 2003 Jul 10 |
Bibliographical note
Funding Information:The authors gratefully acknowledge the financial support from the Micro Thermal System Research Center sponsored by the Korean Science and Engineering Foundation.
Keywords
- Crystallization of amorphous silicon
- External field enhanced crystallization
- Tersoff potential
- Voronoi analysis
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Electrical and Electronic Engineering