Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting

Tae Hee Kim; Jiyoung Hwang; Won Seok Hwang; June Huh; Ho Cheol Kim; Seung Hyun Kim; Jae Min Hong; Edwin L. Thomas; Cheolmin Park

doi:10.1002/adma.200700651

Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting

Tae Hee Kim, Jiyoung Hwang, Won Seok Hwang, June Huh, Ho Cheol Kim, Seung Hyun Kim, Jae Min Hong, Edwin L. Thomas, Cheolmin Park

Research output: Contribution to journal › Article › peer-review

76 Citations (Scopus)

Abstract

A study was conducted to analyze a facile method for fabricating a highly ordered nanostructure of a poly[styrene-block-(ethylene oxide)] (PS-b-PEO) block copolymer by solvent annealing combined with microcontact printing lithography. A micro-patterned PS-b-PEO thin film is prepared by spin casting block copolymer solution on a substrate pre-patterned with self assembled monolayers (SAM) by microcontact printing. The dewetting of the block copolymer film during the solvent annealing for assisting the ordering of block copolymer domains was strictly confined into the micro-patterned regions, leading to a regularly arrayed set of convex lens shaped spherical caps over 1 mm² area where each dewetted domain was composed of nearly single crystal of spherical PEO microdomains. The ordered hierarchical structure was also conveniently formed by the combination of block copolymer self assembly and controlled dewetting with the scale from nanometer, micrometer to millimeter.

Original language	English
Pages (from-to)	522-527
Number of pages	6
Journal	Advanced Materials
Volume	20
Issue number	3
DOIs	https://doi.org/10.1002/adma.200700651
Publication status	Published - 2008 Feb 4
Externally published	Yes

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.200700651

Cite this

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title = "Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting",

abstract = "A study was conducted to analyze a facile method for fabricating a highly ordered nanostructure of a poly[styrene-block-(ethylene oxide)] (PS-b-PEO) block copolymer by solvent annealing combined with microcontact printing lithography. A micro-patterned PS-b-PEO thin film is prepared by spin casting block copolymer solution on a substrate pre-patterned with self assembled monolayers (SAM) by microcontact printing. The dewetting of the block copolymer film during the solvent annealing for assisting the ordering of block copolymer domains was strictly confined into the micro-patterned regions, leading to a regularly arrayed set of convex lens shaped spherical caps over 1 mm2 area where each dewetted domain was composed of nearly single crystal of spherical PEO microdomains. The ordered hierarchical structure was also conveniently formed by the combination of block copolymer self assembly and controlled dewetting with the scale from nanometer, micrometer to millimeter.",

author = "Kim, {Tae Hee} and Jiyoung Hwang and Hwang, {Won Seok} and June Huh and Kim, {Ho Cheol} and Kim, {Seung Hyun} and Hong, {Jae Min} and Thomas, {Edwin L.} and Cheolmin Park",

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AU - Kim, Tae Hee

AU - Hwang, Jiyoung

AU - Hwang, Won Seok

AU - Huh, June

AU - Kim, Ho Cheol

AU - Kim, Seung Hyun

AU - Hong, Jae Min

AU - Thomas, Edwin L.

AU - Park, Cheolmin

PY - 2008/2/4

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N2 - A study was conducted to analyze a facile method for fabricating a highly ordered nanostructure of a poly[styrene-block-(ethylene oxide)] (PS-b-PEO) block copolymer by solvent annealing combined with microcontact printing lithography. A micro-patterned PS-b-PEO thin film is prepared by spin casting block copolymer solution on a substrate pre-patterned with self assembled monolayers (SAM) by microcontact printing. The dewetting of the block copolymer film during the solvent annealing for assisting the ordering of block copolymer domains was strictly confined into the micro-patterned regions, leading to a regularly arrayed set of convex lens shaped spherical caps over 1 mm2 area where each dewetted domain was composed of nearly single crystal of spherical PEO microdomains. The ordered hierarchical structure was also conveniently formed by the combination of block copolymer self assembly and controlled dewetting with the scale from nanometer, micrometer to millimeter.

AB - A study was conducted to analyze a facile method for fabricating a highly ordered nanostructure of a poly[styrene-block-(ethylene oxide)] (PS-b-PEO) block copolymer by solvent annealing combined with microcontact printing lithography. A micro-patterned PS-b-PEO thin film is prepared by spin casting block copolymer solution on a substrate pre-patterned with self assembled monolayers (SAM) by microcontact printing. The dewetting of the block copolymer film during the solvent annealing for assisting the ordering of block copolymer domains was strictly confined into the micro-patterned regions, leading to a regularly arrayed set of convex lens shaped spherical caps over 1 mm2 area where each dewetted domain was composed of nearly single crystal of spherical PEO microdomains. The ordered hierarchical structure was also conveniently formed by the combination of block copolymer self assembly and controlled dewetting with the scale from nanometer, micrometer to millimeter.

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Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting

Abstract

ASJC Scopus subject areas

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