High-quality nonalloyed rhodium-based ohmic contacts to p-type GaN

  • June O. Song*
  • , Dong Seok Leem
  • , Joon Seop Kwak
  • , O. H. Nam
  • , Y. Park
  • , Tae Yeon Seong
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)

Abstract

High-quality nonalloyed rhodium (Rh)-based ohmic contacts to p-type GaN were studied. The mechanisms for the ohmic contact formation without a post-annealing process were investigated using x-ray photoelectron microscopy (XPS). The results implied that Rh interacted with gallium and formed interfacial product such as gallides.

Original languageEnglish
Pages (from-to)2372-2374
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number12
DOIs
Publication statusPublished - 2003 Sept 22
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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