High-rate dry etching of ZnO in BCl3/CH4/H2 plasmas

Jeong Woon Bae, Chang Hyun Jeong, Han Ki Kim, Kyoung Kook Kim, Nam Gil Cho, Tae Yeon Seong, Seong Ju Park, Ilesanmi Adesida, Geun Young Yeom

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Engineering

Material Science

Physics

Pharmacology, Toxicology and Pharmaceutical Science

Chemical Engineering