High temperature isothermal oxidation behavior of NbSi2 coating at 1000–1450 °C

Young Jun Choi, Jin Kook Yoon, Gyeung Ho Kim, Woo Young Yoon, Jung Man Doh, Kyung Tae Hong

Research output: Contribution to journalArticlepeer-review

32 Citations (Scopus)


Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000–1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000–1300 °C but opposite trend was observed at 1300–1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.

Original languageEnglish
Pages (from-to)102-114
Number of pages13
JournalCorrosion Science
Publication statusPublished - 2017 Dec

Bibliographical note

Publisher Copyright:
© 2017 Elsevier Ltd


  • A. Intermetallics
  • B. SEM
  • B. TEM
  • B. XRD
  • C. Oxidation

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Science(all)


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