High temperature isothermal oxidation behavior of NbSi2 coating at 1000–1450 °C

  • Young Jun Choi
  • , Jin Kook Yoon*
  • , Gyeung Ho Kim
  • , Woo Young Yoon
  • , Jung Man Doh
  • , Kyung Tae Hong
  • *Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000–1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000–1300 °C but opposite trend was observed at 1300–1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.

    Original languageEnglish
    Pages (from-to)102-114
    Number of pages13
    JournalCorrosion Science
    Volume129
    DOIs
    Publication statusPublished - 2017 Dec

    Bibliographical note

    Publisher Copyright:
    © 2017 Elsevier Ltd

    Keywords

    • A. Intermetallics
    • B. SEM
    • B. TEM
    • B. XRD
    • C. Oxidation

    ASJC Scopus subject areas

    • General Chemistry
    • General Chemical Engineering
    • General Materials Science

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