High three-terminal breakdown voltage and output power of Sc2O3 passivated AlGaN/GaN high electron mobility transistors

  • B. Luo*
  • , R. Mehandru
  • , Jihyun Kim
  • , F. Ren
  • , B. P. Gila
  • , A. H. Onstine
  • , C. R. Abernathy
  • , S. J. Pearton
  • , D. Gotthold
  • , R. Birkhahn
  • , B. Peres
  • , R. C. Fitch
  • , N. Moser
  • , J. K. Gillespie
  • , T. Jenkins
  • , J. Sewell
  • , D. Via
  • , A. Crespo
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

MBE-deposited Sc2O3 films are found to effectively passivate surface states in the gate-drain region of AlGaN/GaN HEMTs. The effect of the passivation is observed in higher forward IDS-VDS three-terminal breakdown voltage and output power under class A operation. In the latter case, the power-added efficiency was at least doubled.

Original languageEnglish
Pages (from-to)809-810
Number of pages2
JournalElectronics Letters
Volume39
Issue number10
DOIs
Publication statusPublished - 2003 May 15
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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