Highly selective dry etching of III nitrides using an inductively coupled Cl2/Ar/O2 plasma

Ji Myon Lee, Ki Myung Chang, In Hwan Lee, Seong Ju Park

Research output: Contribution to journalArticlepeer-review

37 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Highly selective dry etching of III nitrides using an inductively coupled Cl2/Ar/O2 plasma'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy