Abstract
We report the measurement of the electrical resistivity of a vertical single Ni nanowire. A vertical array of Ni nanowires was fabricated on a Si substrate by electrodeposition using a nanoporous alumina template. The Ni nanowires possessed a face-centered-cubic polycrystalline structure. A voltage-applied atomic force microscope was used to make a nanometer-scale point contact on top of the vertical grown single Ni nanowire. The measured resistance was 1.1 MΩ for a nanowire with length of 3 μm and diameter of 20 nm.
Original language | English |
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Pages (from-to) | 1037-1040 |
Number of pages | 4 |
Journal | Current Applied Physics |
Volume | 10 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2010 Jul |
Keywords
- Electrical resistance
- Single Ni nanowire
- Voltage-applied atomic force microscopy
ASJC Scopus subject areas
- Materials Science(all)
- Physics and Astronomy(all)