I-V characteristics of a vertical single Ni nanowire by voltage-applied atomic force microscopy

D. S. Choi, Y. Rheem, B. Yoo, N. V. Myung, Y. K. Kim*

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    12 Citations (Scopus)

    Abstract

    We report the measurement of the electrical resistivity of a vertical single Ni nanowire. A vertical array of Ni nanowires was fabricated on a Si substrate by electrodeposition using a nanoporous alumina template. The Ni nanowires possessed a face-centered-cubic polycrystalline structure. A voltage-applied atomic force microscope was used to make a nanometer-scale point contact on top of the vertical grown single Ni nanowire. The measured resistance was 1.1 MΩ for a nanowire with length of 3 μm and diameter of 20 nm.

    Original languageEnglish
    Pages (from-to)1037-1040
    Number of pages4
    JournalCurrent Applied Physics
    Volume10
    Issue number4
    DOIs
    Publication statusPublished - 2010 Jul

    Keywords

    • Electrical resistance
    • Single Ni nanowire
    • Voltage-applied atomic force microscopy

    ASJC Scopus subject areas

    • General Materials Science
    • General Physics and Astronomy

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