Identification of dislocations and their influence on the recombination of charge carriers in gallium nitride

A. V. Govorkov, A. Ya Polyakov, T. G. Yugova, N. B. Smirnov, E. A. Petrova, M. V. Mezhennyi, A. V. Markov, I. H. Lee, S. J. Pearton

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

The relation between the density of etch pits revealed in GaN by etching in a KOH/NaOH eutectic and the density of dislocations determined by transmission electron microscopy (TEM) is studied along with the relation between the density of dislocations and the density of dark spot defects observed in GaN by microcathodoluminescence (MCL) and electron-beam-induced current (EBIC). It is demonstrated that selective etching is a reliable rapid method for the determination of the type and density of dislocations in GaN in the range 106-108 cm-2, while MCL and EBIC can be used for the rapid nondestructive determination of the density of dislocations in the range 106-108 cm-2. It is also found that some deep electron and hole traps are related to dislocations.

Original languageEnglish
Pages (from-to)380-385
Number of pages6
JournalJournal of Surface Investigation
Volume1
Issue number4
DOIs
Publication statusPublished - 2007 Aug
Externally publishedYes

Bibliographical note

Funding Information:
The work was supported by the Russian Foundation for Basic Research, project nos. 04-02-16510, 05-02-0815, and 06-02-16212, and by the International Scientific Technical Center, project no. 3029.

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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