Improved local oxidation of silicon carbide using atomic force microscopy

Yeong Deuk Jo, Soo Hyung Seo, Wook Bahng, Sang Cheol Kim, Nam Kyun Kim, Sang Sig Kim, Sang Mo Koo

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    11 Citations (Scopus)

    Abstract

    The atomic force microscopy-based local oxidation (AFM-LO) of silicon carbide (SiC) is extremely difficult in general, mainly due to their physical hardness and chemical inactivity. Herein, we report the strongly enhanced AFM-LO of 4H-SiC at room temperature without the heating, chemicals or photoillumination. It is demonstrated that the increased tip loading force (∼>100 nN) on the highly doped SiC can produce a high enough electric field (∼8× 106 V/cm) under the cathode tip for transporting oxyanions, thereby leading to direct oxide growth on 4H-SiC. The doping concentration and electric field profile of the tip-SiC sample structures were further examined by two-dimensional numerical simulations.

    Original languageEnglish
    Article number082105
    JournalApplied Physics Letters
    Volume96
    Issue number8
    DOIs
    Publication statusPublished - 2010

    Bibliographical note

    Funding Information:
    This work was supported by the “system IC2010” and survey of high efficiency power devices and inverter system for power grid projects of the Korea Ministry of Knowledge Economy.

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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