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Improvement of the morphological stability of Ni-silicided Si 0.8Ge0.2 layers by using a molybdenum interlayer

  • Young Woo Ok*
  • , S. H. Kim
  • , Y. J. Song
  • , K. H. Shim
  • , Tae Yeon Seong
  • *Corresponding author for this work

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