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Improvement of the thermal and chemical stability of Al doped ZnO films
I. H. Kim
*
, D. Y. Ku
, J. H. Ko
,
D. Kim
, K. S. Lee
, J. H. Jeong
, T. S. Lee
, B. Cheong
, Y. J. Baik
, W. M. Kim
*
Corresponding author for this work
Department of Materials Science and Engineering
Research output
:
Contribution to journal
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Article
›
peer-review
29
Citations (Scopus)
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Keyphrases
Thermal Stability
100%
Al-doped ZnO Films
100%
Chemical Stability
100%
AZO Film
100%
Heat Treatment
50%
Resistivity
50%
High Temperature
25%
SnO2
25%
Temperature Range
25%
Pure Zn
25%
Co-sputtering
25%
Sputter-deposited
25%
Carrier Concentration
25%
Diffusion Barrier
25%
Water Vapor
25%
Acidic Solution
25%
Hall Mobility
25%
Protective Layer
25%
ZnSnO
25%
Atmosphere Stability
25%
X-ray Photoelectron Spectroscopy Analysis
25%
Material Science
Film
100%
ZnO
100%
Electrical Resistivity
25%
Heat Treatment
25%
Thermal Stability
12%
X-Ray Photoelectron Spectroscopy
12%
Carrier Concentration
12%
Water Vapor
12%
Hall Mobility
12%