In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Jung Hye Lee, Yong Joo Kim, Joong Yeon Cho, Se Ryeun Yang, Jong Min Kim, Soonmin Yim, Heon Lee, Yeon Sik Jung

    Research output: Contribution to journalArticlepeer-review

    21 Citations (Scopus)

    Abstract

    In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

    Original languageEnglish
    Pages (from-to)4814-4822
    Number of pages9
    JournalAdvanced Materials
    Volume27
    Issue number33
    DOIs
    Publication statusPublished - 2015 Sept 1

    Bibliographical note

    Publisher Copyright:
    © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

    Keywords

    • block copolymers
    • directed self-assembly
    • sub-10 nm
    • warm spin-casting

    ASJC Scopus subject areas

    • General Materials Science
    • Mechanics of Materials
    • Mechanical Engineering

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