In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Jung Hye Lee; Yong Joo Kim; Joong Yeon Cho; Se Ryeun Yang; Jong Min Kim; Soonmin Yim; Heon Lee; Yeon Sik Jung

doi:10.1002/adma.201501363

In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Jung Hye Lee, Yong Joo Kim, Joong Yeon Cho, Se Ryeun Yang, Jong Min Kim, Soonmin Yim, Heon Lee, Yeon Sik Jung

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

Original language	English
Pages (from-to)	4814-4822
Number of pages	9
Journal	Advanced Materials
Volume	27
Issue number	33
DOIs	https://doi.org/10.1002/adma.201501363
Publication status	Published - 2015 Sept 1

Bibliographical note

Publisher Copyright:
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Keywords

block copolymers
directed self-assembly
sub-10 nm
warm spin-casting

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201501363

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title = "In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer",

abstract = "In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.",

keywords = "block copolymers, directed self-assembly, sub-10 nm, warm spin-casting",

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doi = "10.1002/adma.201501363",

language = "English",

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T1 - In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

AU - Lee, Jung Hye

AU - Kim, Yong Joo

AU - Cho, Joong Yeon

AU - Yang, Se Ryeun

AU - Kim, Jong Min

AU - Yim, Soonmin

AU - Lee, Heon

AU - Jung, Yeon Sik

PY - 2015/9/1

Y1 - 2015/9/1

N2 - In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

AB - In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

KW - block copolymers

KW - directed self-assembly

KW - sub-10 nm

KW - warm spin-casting

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U2 - 10.1002/adma.201501363

DO - 10.1002/adma.201501363

M3 - Article

AN - SCOPUS:84940666281

SN - 0935-9648

VL - 27

SP - 4814

EP - 4822

JO - Advanced Materials

JF - Advanced Materials

IS - 33

ER -

In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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