Abstract
In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.
Original language | English |
---|---|
Pages (from-to) | 4814-4822 |
Number of pages | 9 |
Journal | Advanced Materials |
Volume | 27 |
Issue number | 33 |
DOIs | |
Publication status | Published - 2015 Sept 1 |
Keywords
- block copolymers
- directed self-assembly
- sub-10 nm
- warm spin-casting
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering