In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Jung Hye Lee; Yong Joo Kim; Joong Yeon Cho; Se Ryeun Yang; Jong Min Kim; Soonmin Yim; Heon Lee; Yeon Sik Jung

doi:10.1002/adma.201501363

In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Jung Hye Lee, Yong Joo Kim, Joong Yeon Cho, Se Ryeun Yang, Jong Min Kim, Soonmin Yim, Heon Lee, Yeon Sik Jung

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

Original language	English
Pages (from-to)	4814-4822
Number of pages	9
Journal	Advanced Materials
Volume	27
Issue number	33
DOIs	https://doi.org/10.1002/adma.201501363
Publication status	Published - 2015 Sept 1

Keywords

block copolymers
directed self-assembly
sub-10 nm
warm spin-casting

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201501363

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title = "In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer",

abstract = "In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.",

keywords = "block copolymers, directed self-assembly, sub-10 nm, warm spin-casting",

author = "Lee, {Jung Hye} and Kim, {Yong Joo} and Cho, {Joong Yeon} and Yang, {Se Ryeun} and Kim, {Jong Min} and Soonmin Yim and Heon Lee and Jung, {Yeon Sik}",

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year = "2015",

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doi = "10.1002/adma.201501363",

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T1 - In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

AU - Lee, Jung Hye

AU - Kim, Yong Joo

AU - Cho, Joong Yeon

AU - Yang, Se Ryeun

AU - Kim, Jong Min

AU - Yim, Soonmin

AU - Lee, Heon

AU - Jung, Yeon Sik

PY - 2015/9/1

Y1 - 2015/9/1

N2 - In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

AB - In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

KW - block copolymers

KW - directed self-assembly

KW - sub-10 nm

KW - warm spin-casting

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U2 - 10.1002/adma.201501363

DO - 10.1002/adma.201501363

M3 - Article

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VL - 27

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EP - 4822

JO - Advanced Materials

JF - Advanced Materials

IS - 33

ER -

In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Abstract

Keywords

ASJC Scopus subject areas

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