Skip to main navigation Skip to search Skip to main content

Influence of electron tunneling barriers on the performance of InGaN-GaN ultraviolet light-emitting diodes

  • K. C. Kim
  • , Y. C. Choi
  • , D. H. Kim
  • , T. G. Kim*
  • , S. H. Yoon
  • , C. S. Sone
  • , Y. J. Park
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

InGaN-GaN multiple quantum well (MQW) ultraviolet (UV) light-emitting diodes (LEDs) with and without n-AlGaN electron tunneling barriers (ETBs), grown on sapphire substrates by metal organic chemical vapor deposition (MOCVD), are characterized by comparison with device simulation results. Compared with a conventional LED without the ETB, one of the proposed LEDs with the optimized ETB shows an 11% increase in normalized photodiode (PD) currents. We contribute this improvement to the reduced number of hot electron overflowing to the p-side from MQW by low-energy electron tunneling, which is consistent with the simulation results regarding the carrier distributions.

Original languageEnglish
Pages (from-to)2663-2667
Number of pages5
JournalPhysica Status Solidi (A) Applied Research
Volume201
Issue number12
DOIs
Publication statusPublished - 2004 Sept
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Fingerprint

Dive into the research topics of 'Influence of electron tunneling barriers on the performance of InGaN-GaN ultraviolet light-emitting diodes'. Together they form a unique fingerprint.

Cite this