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Influence of MgO and Sc
2
O
3
passivation on AlGaN/GaN high-electron-mobility transistors
B. Luo
*
, J. W. Johnson
, J. Kim
, R. M. Mehandru
, F. Ren
, B. P. Gila
, A. H. Onstine
, C. R. Abernathy
, S. J. Pearton
, A. G. Baca
, R. D. Briggs
, R. J. Shul
, C. Monier
, J. Han
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Article
›
peer-review
189
Citations (Scopus)
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2
O
3
passivation on AlGaN/GaN high-electron-mobility transistors'. Together they form a unique fingerprint.
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Keyphrases
AlGaN-GaN
100%
Dielectric
33%
Drain Current
33%
GaN HEMT
100%
Gate Lag
33%
Lag Effect
33%
Long-term Device Stability
33%
Low Temperature
33%
Passivation
100%
Plasma-assisted Molecular Beam Epitaxy
33%
Scandium Oxide
100%
Surface States
33%
Surface Traps
33%
Material Science
Dielectric Material
50%
Electron Mobility
100%
Magnesium Oxide
100%
Molecular Beam Epitaxy
50%
Surface (Surface Science)
100%
Transistor
100%
Engineering
Current Drain
33%
Dielectrics
33%
Low-Temperature
33%
Passivation
100%
Surface State
33%
Earth and Planetary Sciences
Dielectric Material
50%
High Electron Mobility Transistors
100%
Molecular Beam Epitaxy
50%