TY - JOUR
T1 - Initial adsorption and kondo resonance of 5,10,15,20-tetrakis(4- bromophenyl)porphyrin-co molecules on ag/si(111) surface studied by low-temperature scanning tunneling microscopy/spectroscopy
AU - Li, Qing
AU - Yamazaki, Shiro
AU - Eguchi, Toyoaki
AU - Kim, Howon
AU - Kahng, Se Jong
AU - Jia, Jing Feng
AU - Xue, Qi Kun
AU - Hasegawa, Yukio
PY - 2009/8
Y1 - 2009/8
N2 - The initial adsorption and subsequent Kondo resonance of spin-active 5,10,15,20-tetrakis(4-bromophenyl)porphyrin-Co (TBrPP-Co) molecules on a Si(111)-√3×3√ Ag surface have been studied using low-temperature scanning tunneling microscopy/spectroscopy (STM/S). Different from the case on the Cu(111) surface, all the isolated single TBrPP-Co molecules are anchored in a planar conformation with a slight distortion via their four Br atoms bonding with the Ag atoms of the reconstructed surface structure. The Kondo resonance was also successfully observed above the isolated single molecules adsorbed on the metallic surface. Since the semiconducting Si do not have electronic states at the Fermi level, only the surface state electrons contribute to the observed Kondo resonance.
AB - The initial adsorption and subsequent Kondo resonance of spin-active 5,10,15,20-tetrakis(4-bromophenyl)porphyrin-Co (TBrPP-Co) molecules on a Si(111)-√3×3√ Ag surface have been studied using low-temperature scanning tunneling microscopy/spectroscopy (STM/S). Different from the case on the Cu(111) surface, all the isolated single TBrPP-Co molecules are anchored in a planar conformation with a slight distortion via their four Br atoms bonding with the Ag atoms of the reconstructed surface structure. The Kondo resonance was also successfully observed above the isolated single molecules adsorbed on the metallic surface. Since the semiconducting Si do not have electronic states at the Fermi level, only the surface state electrons contribute to the observed Kondo resonance.
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U2 - 10.1143/JJAP.48.08JB01
DO - 10.1143/JJAP.48.08JB01
M3 - Article
AN - SCOPUS:77952358899
SN - 0021-4922
VL - 48
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 8 PART 3
M1 - 08JB01
ER -