Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films

Junhyuk Ahn, Sanghyun Jeon, Ho Kun Woo, Junsung Bang, Yong Min Lee, Steven J. Neuhaus, Woo Seok Lee, Taesung Park, Sang Yeop Lee, Byung Ku Jung, Hyungmok Joh, Mingi Seong, Ji Hyuk Choi, Ho Gyu Yoon, Cherie R. Kagan, Soong Ju Oh

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)


Next-generation devices and systems require the development and integration of advanced materials, the realization of which inevitably requires two separate processes: property engineering and patterning. Here, we report a one-step, ink-lithography technique to pattern and engineer the properties of thin films of colloidal nanocrystals that exploits their chemically addressable surface. Colloidal nanocrystals are deposited by solution-based methods to form thin films and a local chemical treatment is applied using an ink-printing technique to simultaneously modify (i) the chemical nature of the nanocrystal surface to allow thin-film patterning and (ii) the physical electronic, optical, thermal, and mechanical properties of the nanocrystal thin films. The ink-lithography technique is applied to the library of colloidal nanocrystals to engineer thin films of metals, semiconductors, and insulators on both rigid and flexible substrates and demonstrate their application in high-resolution image replications, anticounterfeit devices, multicolor filters, thin-film transistors and circuits, photoconductors, and wearable multisensors.

Original languageEnglish
Pages (from-to)15667-15675
Number of pages9
JournalACS nano
Issue number10
Publication statusPublished - 2021 Oct 26

Bibliographical note

Funding Information:
This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (2019R1C1C1003319), and by the NSF through the University of Pennsylvania Materials Research Science and Engineering Center (MRSEC) under Award No. DMR-1720530. This work is also supported by the Creative Materials Discovery Program through the NRF funded by the Ministry of Science and ICT (NRF-2018M3D1A1059001) and Materials Innovation Project (NRF-2021M3H4A3026733, NRF-2020M3H4A3081833) funded by National Research Foundation of Korea. This work was also supported by Samsung Electronics (IO201210-08027-01).

Publisher Copyright:


  • ink-lithography
  • ligand exchange
  • nanocrystal
  • patterning
  • property engineering
  • surface modification

ASJC Scopus subject areas

  • General Materials Science
  • General Engineering
  • General Physics and Astronomy


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