Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films

Junhyuk Ahn; Sanghyun Jeon; Ho Kun Woo; Junsung Bang; Yong Min Lee; Steven J. Neuhaus; Woo Seok Lee; Taesung Park; Sang Yeop Lee; Byung Ku Jung; Hyungmok Joh; Mingi Seong; Ji Hyuk Choi; Ho Gyu Yoon; Cherie R. Kagan; Soong Ju Oh

doi:10.1021/acsnano.1c04772

Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films

Junhyuk Ahn, Sanghyun Jeon, Ho Kun Woo, Junsung Bang, Yong Min Lee, Steven J. Neuhaus, Woo Seok Lee, Taesung Park, Sang Yeop Lee, Byung Ku Jung, Hyungmok Joh, Mingi Seong, Ji Hyuk Choi, Ho Gyu Yoon, Cherie R. Kagan, Soong Ju Oh

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

Next-generation devices and systems require the development and integration of advanced materials, the realization of which inevitably requires two separate processes: property engineering and patterning. Here, we report a one-step, ink-lithography technique to pattern and engineer the properties of thin films of colloidal nanocrystals that exploits their chemically addressable surface. Colloidal nanocrystals are deposited by solution-based methods to form thin films and a local chemical treatment is applied using an ink-printing technique to simultaneously modify (i) the chemical nature of the nanocrystal surface to allow thin-film patterning and (ii) the physical electronic, optical, thermal, and mechanical properties of the nanocrystal thin films. The ink-lithography technique is applied to the library of colloidal nanocrystals to engineer thin films of metals, semiconductors, and insulators on both rigid and flexible substrates and demonstrate their application in high-resolution image replications, anticounterfeit devices, multicolor filters, thin-film transistors and circuits, photoconductors, and wearable multisensors.

Original language	English
Pages (from-to)	15667-15675
Number of pages	9
Journal	ACS nano
Volume	15
Issue number	10
DOIs	https://doi.org/10.1021/acsnano.1c04772
Publication status	Published - 2021 Oct 26

Bibliographical note

Funding Information:
This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (2019R1C1C1003319), and by the NSF through the University of Pennsylvania Materials Research Science and Engineering Center (MRSEC) under Award No. DMR-1720530. This work is also supported by the Creative Materials Discovery Program through the NRF funded by the Ministry of Science and ICT (NRF-2018M3D1A1059001) and Materials Innovation Project (NRF-2021M3H4A3026733, NRF-2020M3H4A3081833) funded by National Research Foundation of Korea. This work was also supported by Samsung Electronics (IO201210-08027-01).

Publisher Copyright:
©

Keywords

ink-lithography
ligand exchange
nanocrystal
patterning
property engineering
surface modification

ASJC Scopus subject areas

General Materials Science
General Engineering
General Physics and Astronomy

Access to Document

10.1021/acsnano.1c04772

Cite this

@article{d1dca0ba9c434ba29be138a4d8918e6f,

title = "Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films",

abstract = "Next-generation devices and systems require the development and integration of advanced materials, the realization of which inevitably requires two separate processes: property engineering and patterning. Here, we report a one-step, ink-lithography technique to pattern and engineer the properties of thin films of colloidal nanocrystals that exploits their chemically addressable surface. Colloidal nanocrystals are deposited by solution-based methods to form thin films and a local chemical treatment is applied using an ink-printing technique to simultaneously modify (i) the chemical nature of the nanocrystal surface to allow thin-film patterning and (ii) the physical electronic, optical, thermal, and mechanical properties of the nanocrystal thin films. The ink-lithography technique is applied to the library of colloidal nanocrystals to engineer thin films of metals, semiconductors, and insulators on both rigid and flexible substrates and demonstrate their application in high-resolution image replications, anticounterfeit devices, multicolor filters, thin-film transistors and circuits, photoconductors, and wearable multisensors.",

keywords = "ink-lithography, ligand exchange, nanocrystal, patterning, property engineering, surface modification",

author = "Junhyuk Ahn and Sanghyun Jeon and Woo, {Ho Kun} and Junsung Bang and Lee, {Yong Min} and Neuhaus, {Steven J.} and Lee, {Woo Seok} and Taesung Park and Lee, {Sang Yeop} and Jung, {Byung Ku} and Hyungmok Joh and Mingi Seong and Choi, {Ji Hyuk} and Yoon, {Ho Gyu} and Kagan, {Cherie R.} and Oh, {Soong Ju}",

note = "Funding Information: This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (2019R1C1C1003319), and by the NSF through the University of Pennsylvania Materials Research Science and Engineering Center (MRSEC) under Award No. DMR-1720530. This work is also supported by the Creative Materials Discovery Program through the NRF funded by the Ministry of Science and ICT (NRF-2018M3D1A1059001) and Materials Innovation Project (NRF-2021M3H4A3026733, NRF-2020M3H4A3081833) funded by National Research Foundation of Korea. This work was also supported by Samsung Electronics (IO201210-08027-01). Publisher Copyright: {\textcopyright} ",

year = "2021",

month = oct,

day = "26",

doi = "10.1021/acsnano.1c04772",

language = "English",

volume = "15",

pages = "15667--15675",

journal = "ACS nano",

issn = "1936-0851",

publisher = "American Chemical Society",

number = "10",

}

TY - JOUR

T1 - Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films

AU - Ahn, Junhyuk

AU - Jeon, Sanghyun

AU - Woo, Ho Kun

AU - Bang, Junsung

AU - Lee, Yong Min

AU - Neuhaus, Steven J.

AU - Lee, Woo Seok

AU - Park, Taesung

AU - Lee, Sang Yeop

AU - Jung, Byung Ku

AU - Joh, Hyungmok

AU - Seong, Mingi

AU - Choi, Ji Hyuk

AU - Yoon, Ho Gyu

AU - Kagan, Cherie R.

AU - Oh, Soong Ju

N1 - Funding Information: This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (2019R1C1C1003319), and by the NSF through the University of Pennsylvania Materials Research Science and Engineering Center (MRSEC) under Award No. DMR-1720530. This work is also supported by the Creative Materials Discovery Program through the NRF funded by the Ministry of Science and ICT (NRF-2018M3D1A1059001) and Materials Innovation Project (NRF-2021M3H4A3026733, NRF-2020M3H4A3081833) funded by National Research Foundation of Korea. This work was also supported by Samsung Electronics (IO201210-08027-01). Publisher Copyright: ©

PY - 2021/10/26

Y1 - 2021/10/26

N2 - Next-generation devices and systems require the development and integration of advanced materials, the realization of which inevitably requires two separate processes: property engineering and patterning. Here, we report a one-step, ink-lithography technique to pattern and engineer the properties of thin films of colloidal nanocrystals that exploits their chemically addressable surface. Colloidal nanocrystals are deposited by solution-based methods to form thin films and a local chemical treatment is applied using an ink-printing technique to simultaneously modify (i) the chemical nature of the nanocrystal surface to allow thin-film patterning and (ii) the physical electronic, optical, thermal, and mechanical properties of the nanocrystal thin films. The ink-lithography technique is applied to the library of colloidal nanocrystals to engineer thin films of metals, semiconductors, and insulators on both rigid and flexible substrates and demonstrate their application in high-resolution image replications, anticounterfeit devices, multicolor filters, thin-film transistors and circuits, photoconductors, and wearable multisensors.

AB - Next-generation devices and systems require the development and integration of advanced materials, the realization of which inevitably requires two separate processes: property engineering and patterning. Here, we report a one-step, ink-lithography technique to pattern and engineer the properties of thin films of colloidal nanocrystals that exploits their chemically addressable surface. Colloidal nanocrystals are deposited by solution-based methods to form thin films and a local chemical treatment is applied using an ink-printing technique to simultaneously modify (i) the chemical nature of the nanocrystal surface to allow thin-film patterning and (ii) the physical electronic, optical, thermal, and mechanical properties of the nanocrystal thin films. The ink-lithography technique is applied to the library of colloidal nanocrystals to engineer thin films of metals, semiconductors, and insulators on both rigid and flexible substrates and demonstrate their application in high-resolution image replications, anticounterfeit devices, multicolor filters, thin-film transistors and circuits, photoconductors, and wearable multisensors.

KW - ink-lithography

KW - ligand exchange

KW - nanocrystal

KW - patterning

KW - property engineering

KW - surface modification

UR - http://www.scopus.com/inward/record.url?scp=85115633416&partnerID=8YFLogxK

U2 - 10.1021/acsnano.1c04772

DO - 10.1021/acsnano.1c04772

M3 - Article

C2 - 34495639

AN - SCOPUS:85115633416

SN - 1936-0851

VL - 15

SP - 15667

EP - 15675

JO - ACS nano

JF - ACS nano

IS - 10

ER -

Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this