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Interfacial characteristics of N-incorporated HfAlO high-k thin films
M. H. Cho, D. W. Moon, S. A. Park, Y. K. Kim, K. Jeong, S. K. Kang, D. H. Ko, S. J. Doh, J. H. Lee, N. I. Lee
Research output: Contribution to journal › Article › peer-review
33
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(Scopus)