Investigation of the effects of bottom anti-reflective coating on nanoscale patterns by laser interference lithography

Eun Mi Park; Jinnil Choi; Byung Hyun Kang; Ki Young Dong; Yunkwon Park; In Sang Song; Byeong Kwon Ju

doi:10.1016/j.tsf.2011.02.054

Investigation of the effects of bottom anti-reflective coating on nanoscale patterns by laser interference lithography

Eun Mi Park, Jinnil Choi, Byung Hyun Kang, Ki Young Dong, Yunkwon Park, In Sang Song, Byeong Kwon Ju

School of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Enhanced resolution of the structures can be achieved by employing the bottom anti-reflective coating (BARC) material in laser interference lithography process. The purpose of the BARC is to control the reflection of light at the surface of the wafer to minimize the effects caused by reflection. Lloyd's mirror interferometer is utilized for the experiment with 257 nm wavelength Ar-Ion laser used as the light source to generate one-dimensional nanoscale patterns. By adjusting reflectivity through application of the BARC material, scattering of the patterns are reduced. The effects of BARC material are explored to confirm the reduction of the vertical standing wave, which is the main cause of undesirable nanoscale patterns. It is also highlighted that improvements through utilization of BARC material enables smaller pattern size with a set pitch size by controlling the exposure energy.

Original language	English
Pages (from-to)	4220-4224
Number of pages	5
Journal	Thin Solid Films
Volume	519
Issue number	13
DOIs	https://doi.org/10.1016/j.tsf.2011.02.054
Publication status	Published - 2011 Apr 29

Bibliographical note

Funding Information:
This research was supported by Basic Science Research Program of the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (No. 2009-0083126 ), partially supported by World Class University ( WCU, R32-2008-000-10082-0 ), and Samsung Advanced Institute of Technology .

Keywords

Bottom anti-reflective coating
Laser interference lithography
Nanoscale patterning

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2011.02.054

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title = "Investigation of the effects of bottom anti-reflective coating on nanoscale patterns by laser interference lithography",

abstract = "Enhanced resolution of the structures can be achieved by employing the bottom anti-reflective coating (BARC) material in laser interference lithography process. The purpose of the BARC is to control the reflection of light at the surface of the wafer to minimize the effects caused by reflection. Lloyd's mirror interferometer is utilized for the experiment with 257 nm wavelength Ar-Ion laser used as the light source to generate one-dimensional nanoscale patterns. By adjusting reflectivity through application of the BARC material, scattering of the patterns are reduced. The effects of BARC material are explored to confirm the reduction of the vertical standing wave, which is the main cause of undesirable nanoscale patterns. It is also highlighted that improvements through utilization of BARC material enables smaller pattern size with a set pitch size by controlling the exposure energy.",

keywords = "Bottom anti-reflective coating, Laser interference lithography, Nanoscale patterning",

author = "Park, {Eun Mi} and Jinnil Choi and Kang, {Byung Hyun} and Dong, {Ki Young} and Yunkwon Park and Song, {In Sang} and Ju, {Byeong Kwon}",

note = "Funding Information: This research was supported by Basic Science Research Program of the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (No. 2009-0083126 ), partially supported by World Class University ( WCU, R32-2008-000-10082-0 ), and Samsung Advanced Institute of Technology .",

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AU - Park, Eun Mi

AU - Choi, Jinnil

AU - Kang, Byung Hyun

AU - Dong, Ki Young

AU - Park, Yunkwon

AU - Song, In Sang

AU - Ju, Byeong Kwon

N1 - Funding Information: This research was supported by Basic Science Research Program of the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (No. 2009-0083126 ), partially supported by World Class University ( WCU, R32-2008-000-10082-0 ), and Samsung Advanced Institute of Technology .

PY - 2011/4/29

Y1 - 2011/4/29

N2 - Enhanced resolution of the structures can be achieved by employing the bottom anti-reflective coating (BARC) material in laser interference lithography process. The purpose of the BARC is to control the reflection of light at the surface of the wafer to minimize the effects caused by reflection. Lloyd's mirror interferometer is utilized for the experiment with 257 nm wavelength Ar-Ion laser used as the light source to generate one-dimensional nanoscale patterns. By adjusting reflectivity through application of the BARC material, scattering of the patterns are reduced. The effects of BARC material are explored to confirm the reduction of the vertical standing wave, which is the main cause of undesirable nanoscale patterns. It is also highlighted that improvements through utilization of BARC material enables smaller pattern size with a set pitch size by controlling the exposure energy.

AB - Enhanced resolution of the structures can be achieved by employing the bottom anti-reflective coating (BARC) material in laser interference lithography process. The purpose of the BARC is to control the reflection of light at the surface of the wafer to minimize the effects caused by reflection. Lloyd's mirror interferometer is utilized for the experiment with 257 nm wavelength Ar-Ion laser used as the light source to generate one-dimensional nanoscale patterns. By adjusting reflectivity through application of the BARC material, scattering of the patterns are reduced. The effects of BARC material are explored to confirm the reduction of the vertical standing wave, which is the main cause of undesirable nanoscale patterns. It is also highlighted that improvements through utilization of BARC material enables smaller pattern size with a set pitch size by controlling the exposure energy.

KW - Bottom anti-reflective coating

KW - Laser interference lithography

KW - Nanoscale patterning

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Investigation of the effects of bottom anti-reflective coating on nanoscale patterns by laser interference lithography

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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