Kerf-less layer transfer of monocrystalline silicon used by hydrogen implantation

Changbum Lee, Jaewoo Lee, Jiwoong Kim, Bo Yun Jang, Wooyoung Yoon

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    In this study, we performed a quantitative analysis of the kerfless layer transfer behavior of silicon resulting from hydrogen implantation. To determine the optimum implantation energy, a Monte Carlo simulation tool called Stopping and Range of Ions in Matter (SRIM) was employed. Based on the simulation results, experimental methods that reflected the calculated SRIM values were adopted. The effect of hydrogen implantation in single crystalline silicon was investigated at 2.0 MeV, which corresponds to a maximum hydrogen concentration depth of 48.7 μm. Exfoliation behaviors were also compared as a function of both ion implantation and the crystallographic orientation of silicon. We conclude that 6 × 1016 atoms/cm2 are required for separating samples in '111'-oriented silicon, and that 9 × 1016 atoms/cm2 are required for the '100' direction. An electron probe X-ray microanalyzer (EPMA) and a scanning electron microscope (SEM) were used to determine the mean projection range and analyze the crack distribution initiated by hydrogen diffusion.

    Original languageEnglish
    Pages (from-to)10620-10624
    Number of pages5
    JournalJournal of Nanoscience and Nanotechnology
    Volume16
    Issue number10
    DOIs
    Publication statusPublished - 2016 Oct

    Bibliographical note

    Funding Information:
    This work was supported by the International Collaborative Energy Technology RandD Program of Energy Technology Evaluation and Planning (KETEP), granted financial resource from the Ministry of Trade, Industry and Energy, Republic of Korea. (No. 20148520120040). This work was conducted under the framework of the Research and Development Program of the Korea Institute of Energy Research (KIER) (B6-2426). This study was supported by a grant from the National Research Foundation of Korea (NRF), funded by the Korean government (MEST) (2011-0028757).

    Publisher Copyright:
    Copyright © 2016 American Scientific Publishers All rights reserved.

    Keywords

    • Implantation
    • Kerf-Less
    • Wafering

    ASJC Scopus subject areas

    • Bioengineering
    • General Chemistry
    • Biomedical Engineering
    • General Materials Science
    • Condensed Matter Physics

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