Large-scale laser patterning of silver nanowire network by using patterned optical mirror mask

We report a scalable method to produce silver nanowire (AgNW) patterns via a high-throughput laser ablation process by using an infrared laser line beam system coupled with a patterned optical mirror (POM) mask. The POM mask was prepared by forming multiple dielectric layers on an optical mirror, through which the laser beam is directed onto a selected area to ablate the nanowires, thereby generating the AgNW patterns. The POMbased laser ablation method provides a facile route toward patterning AgNW networks on flexible substrates into diverse designs. The quality of the AgNW patterns can be tuned by the optimization of processing parameters such as laser power, scanning speed, and location of the focal plane. Compared to other common patterning methods, the POM-based laser patterning process described here is simpler, faster, and more cost-effective.