Lateral force microscopy investigations of the crystallization of SrBi₂Ta₂O₉ thin films

Keyphrases

• SrBi2Ta2O9 100%
• Crystallization 100%
• Lateral Force Microscopy 100%
• Annealing 75%
• Microscope Image 50%
• Friction Coefficient 50%
• Matrix Phase 50%
• X Ray Diffraction 25%
• Surface Morphology 25%
• Silicon Nitride 25%
• Sol-gel Method 25%
• Post-annealing 25%
• X-ray Diffraction Pattern 25%
• Silicon Wafer 25%
• Annealing Temperature 25%
• Post-annealing Temperature 25%
• Polarization Field 25%
• Hysteresis Loop 25%
• Line Profiles 25%

Engineering

• Thin Films 100%
• Lateral Force 100%
• Matrix Phase 50%
• Friction Coefficient 50%
• Coefficient of Friction 50%
• Ray Diffraction 25%
• Hysteresis Loop 25%
• Surface Morphology 25%
• X-Ray Diffraction Pattern 25%
• Annealing Temperature 25%
• Silicon Wafer 25%
• Nitride 25%
• Sol-Gel Process 25%
• Line Profile 25%
• Polarization Field 25%

Material Science

• Thin Films 100%
• Ferroelectric Material 100%
• X-Ray Diffraction 66%
• Annealing 33%
• Surface Morphology 33%
• Silicon Nitride 33%
• Ferroelectricity 33%
• Diffraction Pattern 33%
• Sol-Gel 33%
• Silicon Wafer 33%
• Coefficient of Friction 33%
• Surface (Surface Science) 33%