Light extraction in organic light emitting diodes using SF6/CHF3 plasma treated random pattern

Ju Hyun Hwang; Tae Hyun Park; Hyun Jun Lee; Kyung Bok Choi; Young Wook Park; Byeong Kwon Ju

doi:10.1002/j.2168-0159.2013.tb06526.x

Light extraction in organic light emitting diodes using SF6/CHF3 plasma treated random pattern

Ju Hyun Hwang, Tae Hyun Park, Hyun Jun Lee, Kyung Bok Choi, Young Wook Park, Byeong Kwon Ju

Research output: Contribution to journal › Article › peer-review

Abstract

The random pattern using the SF6/CHF3 plasma can increase the external quantum efficiency and power efficiency of the organic light emitting diodes without introducing spectral changes. These random pattern layer are formed by SF6/CHF3 plasma treatment on the resin, which can be applied to the large-area and white OLEDs.

Original language	English
Pages (from-to)	1477-1479
Number of pages	3
Journal	Digest of Technical Papers - SID International Symposium
Volume	44
Issue number	1
DOIs	https://doi.org/10.1002/j.2168-0159.2013.tb06526.x
Publication status	Published - 2013 Jun

Keywords

light extraction
Organic Light-Emitting Diodes
random pattern
SF6/CHF3 plasma

ASJC Scopus subject areas

General Engineering

Access to Document

10.1002/j.2168-0159.2013.tb06526.x

Cite this

@article{af53477723b94d5d9ca110101fcb478c,

title = "Light extraction in organic light emitting diodes using SF6/CHF3 plasma treated random pattern",

abstract = "The random pattern using the SF6/CHF3 plasma can increase the external quantum efficiency and power efficiency of the organic light emitting diodes without introducing spectral changes. These random pattern layer are formed by SF6/CHF3 plasma treatment on the resin, which can be applied to the large-area and white OLEDs.",

keywords = "light extraction, Organic Light-Emitting Diodes, random pattern, SF6/CHF3 plasma",

author = "Hwang, {Ju Hyun} and Park, {Tae Hyun} and Lee, {Hyun Jun} and Choi, {Kyung Bok} and Park, {Young Wook} and Ju, {Byeong Kwon}",

year = "2013",

month = jun,

doi = "10.1002/j.2168-0159.2013.tb06526.x",

language = "English",

volume = "44",

pages = "1477--1479",

journal = "Digest of Technical Papers - SID International Symposium",

issn = "0097-966X",

publisher = "John Wiley and Sons Inc.",

number = "1",

}

TY - JOUR

T1 - Light extraction in organic light emitting diodes using SF6/CHF3 plasma treated random pattern

AU - Hwang, Ju Hyun

AU - Park, Tae Hyun

AU - Lee, Hyun Jun

AU - Choi, Kyung Bok

AU - Park, Young Wook

AU - Ju, Byeong Kwon

PY - 2013/6

Y1 - 2013/6

N2 - The random pattern using the SF6/CHF3 plasma can increase the external quantum efficiency and power efficiency of the organic light emitting diodes without introducing spectral changes. These random pattern layer are formed by SF6/CHF3 plasma treatment on the resin, which can be applied to the large-area and white OLEDs.

AB - The random pattern using the SF6/CHF3 plasma can increase the external quantum efficiency and power efficiency of the organic light emitting diodes without introducing spectral changes. These random pattern layer are formed by SF6/CHF3 plasma treatment on the resin, which can be applied to the large-area and white OLEDs.

KW - light extraction

KW - Organic Light-Emitting Diodes

KW - random pattern

KW - SF6/CHF3 plasma

UR - http://www.scopus.com/inward/record.url?scp=84905259844&partnerID=8YFLogxK

U2 - 10.1002/j.2168-0159.2013.tb06526.x

DO - 10.1002/j.2168-0159.2013.tb06526.x

M3 - Article

AN - SCOPUS:84905259844

SN - 0097-966X

VL - 44

SP - 1477

EP - 1479

JO - Digest of Technical Papers - SID International Symposium

JF - Digest of Technical Papers - SID International Symposium

IS - 1

ER -

Light extraction in organic light emitting diodes using SF6/CHF3 plasma treated random pattern

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this