Abstract
Au nanoparticle (NP)-modified Si nanomembrane (Si NM) Schottky barrier diodes (SBDs) were fabricated by using a transfer-printing method to create pedestals using only one photomask on a flexible substrate. The transfer using the pedestals afforded a yield of >95% with no significant cracks. The plasmonic Au NPs can facilitate the improvement of the incident optical absorption. The Au NP-modified Si NM SBD exhibited enhanced photoresponse characteristics with an external quantum efficiency (hEQE) of 34%, a photosensitivity (P) of 27 at a voltage bias of -5 V, a light intensity of 1.2Wcm?2, and a responsivity (Rph ) of 0.21 AW?1. Additionally, the mechanical bending characteristics of the device were observed while a compressive strain up to 0.62% was applied to the diode. The results suggest that the Au NP-modified Si NM SBD has great potential for use in multifunction devices as a strain sensor and photosensor.
Original language | English |
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Article number | 485501 |
Journal | Nanotechnology |
Volume | 26 |
Issue number | 48 |
DOIs | |
Publication status | Published - 2015 Nov 6 |
Keywords
- Au nanoparticle
- localized surface plasmon
- photosensor
- Schottky barrier diode
- silicon nanomembrane
- strain sensor
ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Electrical and Electronic Engineering
- Mechanical Engineering
- Mechanics of Materials
- Materials Science(all)