Magnetic properties of TbFe thin films under applied stress

M. Pasquale; A. Infortuna; L. Martino; C. Sasso; C. Beatrice; S. H. Lim

doi:10.1016/S0304-8853(00)00283-3

Magnetic properties of TbFe thin films under applied stress

M. Pasquale^*
, A. Infortuna
, L. Martino
, C. Sasso
, C. Beatrice
, S. H. Lim

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

8 Citations (Scopus)

Abstract

The magnetic properties of a set of Tb_xFe_1-x magnetostrictive thin films are measured under applied stress in a cantilever configuration. The 1 μm thick films are produced on 200 μm thick Si (1 0 0) substrates by magnetron sputtering in Ar atmosphere. Magnetic characterization is obtained with complementary fluxmetric and magneto-optic Kerr effect methods. The role of stress-induced anisotropy is discussed, with reference to the intrinsic anisotropy which can lie in-plane or out-of-plane depending on composition. An optimal film composition at x = 54 at % is determined for sensor applications requiring magnetic softness and stress sensitivity.

Original language	English
Pages (from-to)	769-771
Number of pages	3
Journal	Journal of Magnetism and Magnetic Materials
Volume	215
DOIs	https://doi.org/10.1016/S0304-8853(00)00283-3
Publication status	Published - 2000 Jun 2
Externally published	Yes
Event	14th International Symposium on Soft Magnetic Materials (SMM14) - Balatonfured, Hung Duration: 1999 Sept 8 → 1999 Sept 10

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1016/S0304-8853(00)00283-3

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@article{b0cb275fe81c49e2a157787a48f8e2db,

title = "Magnetic properties of TbFe thin films under applied stress",

abstract = "The magnetic properties of a set of TbxFe1-x magnetostrictive thin films are measured under applied stress in a cantilever configuration. The 1 μm thick films are produced on 200 μm thick Si (1 0 0) substrates by magnetron sputtering in Ar atmosphere. Magnetic characterization is obtained with complementary fluxmetric and magneto-optic Kerr effect methods. The role of stress-induced anisotropy is discussed, with reference to the intrinsic anisotropy which can lie in-plane or out-of-plane depending on composition. An optimal film composition at x = 54 at \% is determined for sensor applications requiring magnetic softness and stress sensitivity.",

author = "M. Pasquale and A. Infortuna and L. Martino and C. Sasso and C. Beatrice and Lim, \{S. H.\}",

year = "2000",

month = jun,

day = "2",

doi = "10.1016/S0304-8853(00)00283-3",

language = "English",

volume = "215",

pages = "769--771",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

publisher = "Elsevier B.V.",

note = "14th International Symposium on Soft Magnetic Materials (SMM14) ; Conference date: 08-09-1999 Through 10-09-1999",

}

TY - JOUR

T1 - Magnetic properties of TbFe thin films under applied stress

AU - Pasquale, M.

AU - Infortuna, A.

AU - Martino, L.

AU - Sasso, C.

AU - Beatrice, C.

AU - Lim, S. H.

PY - 2000/6/2

Y1 - 2000/6/2

N2 - The magnetic properties of a set of TbxFe1-x magnetostrictive thin films are measured under applied stress in a cantilever configuration. The 1 μm thick films are produced on 200 μm thick Si (1 0 0) substrates by magnetron sputtering in Ar atmosphere. Magnetic characterization is obtained with complementary fluxmetric and magneto-optic Kerr effect methods. The role of stress-induced anisotropy is discussed, with reference to the intrinsic anisotropy which can lie in-plane or out-of-plane depending on composition. An optimal film composition at x = 54 at % is determined for sensor applications requiring magnetic softness and stress sensitivity.

AB - The magnetic properties of a set of TbxFe1-x magnetostrictive thin films are measured under applied stress in a cantilever configuration. The 1 μm thick films are produced on 200 μm thick Si (1 0 0) substrates by magnetron sputtering in Ar atmosphere. Magnetic characterization is obtained with complementary fluxmetric and magneto-optic Kerr effect methods. The role of stress-induced anisotropy is discussed, with reference to the intrinsic anisotropy which can lie in-plane or out-of-plane depending on composition. An optimal film composition at x = 54 at % is determined for sensor applications requiring magnetic softness and stress sensitivity.

UR - https://www.scopus.com/pages/publications/0033704942

UR - https://www.scopus.com/pages/publications/0033704942#tab=citedBy

U2 - 10.1016/S0304-8853(00)00283-3

DO - 10.1016/S0304-8853(00)00283-3

M3 - Conference article

AN - SCOPUS:0033704942

SN - 0304-8853

VL - 215

SP - 769

EP - 771

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

T2 - 14th International Symposium on Soft Magnetic Materials (SMM14)

Y2 - 8 September 1999 through 10 September 1999

ER -

Magnetic properties of TbFe thin films under applied stress

Abstract

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