Magnetization reversal under non-uniform magnetic fields

K. S. Kim; C. E. Lee; S. H. Lim

Magnetization reversal under non-uniform magnetic fields

Research output: Contribution to journal › Conference article › peer-review

Abstract

Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.

Original language	English
Pages (from-to)	DP04
Journal	Digests of the Intermag Conference
Publication status	Published - 2003
Event	Intermag 2003: International Magnetics Conference - Boston, MA, United States Duration: 2003 Mar 28 → 2003 Apr 3

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

@article{8d0baac3ab2f435489fde128a64e22e5,

title = "Magnetization reversal under non-uniform magnetic fields",

abstract = "Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.",

author = "Kim, {K. S.} and Lee, {C. E.} and Lim, {S. H.}",

year = "2003",

language = "English",

pages = "DP04",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Intermag 2003: International Magnetics Conference ; Conference date: 28-03-2003 Through 03-04-2003",

}

TY - JOUR

T1 - Magnetization reversal under non-uniform magnetic fields

AU - Kim, K. S.

AU - Lee, C. E.

AU - Lim, S. H.

PY - 2003

Y1 - 2003

N2 - Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.

AB - Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.

UR - http://www.scopus.com/inward/record.url?scp=0141568010&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0141568010

SN - 0074-6843

SP - DP04

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - Intermag 2003: International Magnetics Conference

Y2 - 28 March 2003 through 3 April 2003

ER -

Magnetization reversal under non-uniform magnetic fields

Abstract

ASJC Scopus subject areas

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