Magnetization switching of NiFeSiB free layers for magnetic tunnel junctions

B. S. Chun, S. P. Ko, B. S. Oh, J. Y. Hwang, J. R. Rhee, T. W. Kim, S. Saito, S. Yoshimura, M. Tsunoda, M. Takahashi, Y. K. Kim

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)

    Abstract

    Ferromagnetic amorphous Ni16Fe62Si8B14 layer have been studied as free layers for magnetic tunnel junctions (MTJs) to enhance cell switching performance. Traditional MTJ free layer materials such as NiFe and CoFe were also prepared for switching comparison purposes. Both NiFeSiB and NiFe resulted in an order of magnitude smaller switching fields compared to the CoFe. The switching field was further reduced for the synthetic antiferromagnetic NiFeSiB free layered structure.

    Original languageEnglish
    Pages (from-to)e258-e260
    JournalJournal of Magnetism and Magnetic Materials
    Volume304
    Issue number1
    DOIs
    Publication statusPublished - 2006 Sept

    Bibliographical note

    Funding Information:
    This work was supported by the National Program for Tera-level Nanodevices as a 21st Century Frontier Program, by Grant R01-2003-00-10644-0 from the Basic Research Program, and by Grant M10500000105-05J0000-10510 from the National Research Laboratory Program of the Korea Science and Engineering Foundation.

    Keywords

    • Amorphous ferromagnet
    • Magnetic tunnel junctions
    • NiFeSiB film

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics

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