Magnetostriction of Tb-Fe-(B) Thin Films Fabricated by RF Magnetron Sputtering

S. H. Lim, Y. S. Choi, S. H. Han, H. J. Kim, T. Shw, H. Fujimorit

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)


The magnetostriction of TbFe and TbFeB thin films is systematically investigated over a wide composition range from 40.2 to 68.1 at.% Tb for the Bfree alloys and from 44.1 to 66.6 at.% Tb for the B containing thin films. The films were fabricated by rf magnetron sputtering. The microstructure mainly consists of an amorphous phase at low Tb contents and, at high Tb contents, a mixture of an amorphous phase and an a Tb phase. Excellent magnetostrictive characteristics, particularly at low magnetic fields, are achieved in both TbFe and TbFeB thin films; for example, a magnetostriction of 138 ppm is obtained in a TbFeB thin film at a magnetic field as low as 30 Oe. These excellent magnetostrictive properties of the present thin films are supported by the excellent magnetic softness, the coercivity below 10 Oe and a typical squared-loop shape with the saturation field as low as 1 kOe. It is considered that, due to the excellent low field magnetostrictive characteristics, the present TbFe based magnetostrictive thin films are suitable for Si based microdevices.

Original languageEnglish
Pages (from-to)3940-3942
Number of pages3
JournalIEEE Transactions on Magnetics
Issue number5 PART 2
Publication statusPublished - 1997
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


Dive into the research topics of 'Magnetostriction of Tb-Fe-(B) Thin Films Fabricated by RF Magnetron Sputtering'. Together they form a unique fingerprint.

Cite this