Manufacturable parasitic-aware circuit-level FETs in 65-nm SOI CMOS technology

Daeik Kim, Jonghae Kim, Jean Olivier Plouchart, Choongyeun Cho, Robert Trzcinski, Sungjae Lee, Mahender Kumar, Christine Norris, Jae Sung Rieh, Greg Freeman, David Ahlgren

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


This letter reports the statistical analysis of circuit-level FET high-speed performance in 65-nm silicon-on-insulator CMOS technology. Practical performance metrics are derived from full 300-mm wafer measurements. The proposed circuit-level layout wiring parasitics-aware FET reflects realistic FET that is placed in circuits. Its measurement and model are directly applicable to circuit design in conjunction with multiple layers of yield and manufacturability considerations. A stretched gate-pitch NFET design shows an average current gain cutoff frequency fT of 250 GHz, with 7.6% standard deviation, 6.7% mismatch standard deviation, and maximum fT of 307 GHz. The proposed characterization methodology will become more relevant to technologies beyond 65 nm.

Original languageEnglish
Pages (from-to)520-522
Number of pages3
JournalIEEE Electron Device Letters
Issue number6
Publication statusPublished - 2007 Jun


  • 65-nm silicon-on-insulator (SOI) CMOS
  • Circuit-level FET with wiring parasitics
  • Current gain cutoff frequency f
  • FET yield and manufacturability
  • Full 300-mm wafer statistical analysis

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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