Maskless optical microscope lithography system

Eung Seok Park; Doyoung Jang; Jaewoo Lee; Yun Jeong Kim; Junhong Na; Hyunjin Ji; Jae Wan Choi; Gyu Tae Kim

doi:10.1063/1.3266965

Maskless optical microscope lithography system

Eung Seok Park, Doyoung Jang, Jaewoo Lee, Yun Jeong Kim, Junhong Na, Hyunjin Ji, Jae Wan Choi, Gyu Tae Kim

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.

Original language	English
Article number	126101
Journal	Review of Scientific Instruments
Volume	80
Issue number	12
DOIs	https://doi.org/10.1063/1.3266965
Publication status	Published - 2009

ASJC Scopus subject areas

Instrumentation

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10.1063/1.3266965

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title = "Maskless optical microscope lithography system",

abstract = "A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.",

author = "Park, {Eung Seok} and Doyoung Jang and Jaewoo Lee and Kim, {Yun Jeong} and Junhong Na and Hyunjin Ji and Choi, {Jae Wan} and Kim, {Gyu Tae}",

note = "Funding Information: This research was supported by the Tera-level Nano-Devices (TND) program and Grant No. M10503000187-05M0300-18710 from the Korea Ministry of Science and Technology.",

year = "2009",

doi = "10.1063/1.3266965",

language = "English",

volume = "80",

journal = "Review of Scientific Instruments",

issn = "0034-6748",

publisher = "American Institute of Physics Publising LLC",

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T1 - Maskless optical microscope lithography system

AU - Park, Eung Seok

AU - Jang, Doyoung

AU - Lee, Jaewoo

AU - Kim, Yun Jeong

AU - Na, Junhong

AU - Ji, Hyunjin

AU - Choi, Jae Wan

AU - Kim, Gyu Tae

N1 - Funding Information: This research was supported by the Tera-level Nano-Devices (TND) program and Grant No. M10503000187-05M0300-18710 from the Korea Ministry of Science and Technology.

PY - 2009

Y1 - 2009

N2 - A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.

AB - A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.

UR - http://www.scopus.com/inward/record.url?scp=73849139998&partnerID=8YFLogxK

U2 - 10.1063/1.3266965

DO - 10.1063/1.3266965

M3 - Article

C2 - 20059175

AN - SCOPUS:73849139998

SN - 0034-6748

VL - 80

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

IS - 12

M1 - 126101

ER -

Maskless optical microscope lithography system

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