Mesostructured HfxAlyO2 Thin Films as Reliable and Robust Gate Dielectrics with Tunable Dielectric Constants for High-Performance Graphene-Based Transistors

Yunseong Lee, Woojin Jeon, Yeonchoo Cho, Min Hyun Lee, Seong Jun Jeong, Jongsun Park, Seongjun Park

Research output: Contribution to journal › Article › peer-review

23 Citations (Scopus)

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