Keyphrases
Acetone Solution
20%
Adhesive Residue
20%
Coated Substrate
20%
Electron Beam Evaporation
20%
Flexible Substrate
100%
High Aspect Ratio
20%
Lift-off
40%
Metal Film
20%
Metal Pattern
40%
Metal Patterning
100%
Nanoimprint Lithography
100%
Pattern Profiles
40%
Pattern Transfer
100%
Pattern-based Approach
100%
Polyethylene Terephthalate Substrate
60%
Polyvinyl Alcohol
40%
Positive Patterns
20%
Rabbit Ear
40%
Reactive Ion Etching
20%
Resist Pattern
100%
Rigid Substrate
100%
Step-off
20%
Transfer Techniques
100%
Ultraviolet Nanoimprint Lithography (UV-NIL)
20%
UV-curable Adhesive
20%
Water Soaking
20%
Water-soluble
20%
Engineering
Flexible Substrate
100%
High Aspect Ratio
33%
Nanoimprint Lithography
100%
Pattern Transfer
100%
Patterning Process
100%
Significant Change
33%
UV Nanoimprint Lithography
33%
Material Science
Linewidth
33%
Lithography
100%
Metal Film
33%
Polyethylene Terephthalate
100%
Reactive Ion Etching
33%