Abstract
We report on the growth of InGaN/GaN heterostructures on the nitridated α-Al2O3 substrate using metalorganic molecular beam epitaxy (MOMBE) system equipped with an N2 rf-plasma cell. An In incorporation of 41% was achieved without InN phase separation in the InGaN film. The InGaN films showed photoluminescence (PL) spectra corresponding to blue, green, and red colors depending on the In composition. The XRD and PL measurements showed that the red emission from InGaN was originated from the phase-separated InN in the InGaN film.
Original language | English |
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Pages (from-to) | 269-272 |
Number of pages | 4 |
Journal | Physica Status Solidi (A) Applied Research |
Volume | 176 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1999 Nov |
Externally published | Yes |
Event | Proceedings of the 1999 3rd International Conference on Nitride Semiconductors (ICNS'99) - Montpellier, France Duration: 1999 Jul 4 → 1999 Jul 9 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics