Annealing time effect on the magnetotransport properties was investigated for Si/alumina/Ta/NiFe/CoFe/Cu/ CoFe/PtMn/Ta samples having different PtMn thickness (10-30 nm). Post-deposition heat treatment was performed using a vacuum furnace with 3 kOe field at 270°C up to 35 h. The thermally activated atoms diffused, to other layers through grain boundaries during the heat treatment with longer annealing hours resulting in deteriorating ΔR/R. This effect is more profound in films with thicker PtMn layers where interface became rougher after annealing.
Bibliographical noteFunding Information:
This work was supported by Korea Research Foundation Grant (KRF-2000-E00480).
- Giant magnetoresistance
- Spin value
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics