Microstructures of GaN1-xPx layers grown on (0001)GaN substrates by gas source molecular beam epitaxy

Tae Yeon Seong, In Tae Bae, Chel Jong Choi, D. Y. Noh, Y. Zhao, C. W. Tu

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22 Citations (Scopus)


Transmission electron microscope (TEM), transmission electron diffraction (TED), and synchrotron x-ray diffraction (XRD) studies have been performed to investigate microstructural behavior of gas source molecular beam epitaxial GaN1-xPx layers grown on (0001)GaN/sapphire at temperatures (Tg) in the range 500-760°C. TEM, TED, and XRD results indicate that the samples grown at Tg≤600°C undergo phase separation resulting in a mixture of GaN-rich and GaP-rich GaNP with zinc-blende structure. However, the samples grown at Tg≥730°C are found to be binary zinc-blende GaN(P) single crystalline materials. As for the 500°C layer, the two phases are randomly oriented and distributed, whereas the 600°C layer consists of phases that are elongated and inclined by 60°-70° clockwise from the [0001]α-GaN direction. The samples grown at Tg ≥730°C are found to consist of two types of microdomains, namely, GaN(P)I and GaN(P)II; the former having twin relation to the latter.

Original languageEnglish
Pages (from-to)3192-3197
Number of pages6
JournalJournal of Applied Physics
Issue number6
Publication statusPublished - 1999 Mar 15
Externally publishedYes

ASJC Scopus subject areas

  • General Physics and Astronomy


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