Abstract
Multifunctional particle coating by Plasma-Enhanced Chemical Vapor Deposition (PECVD) and its application are presented in this review. A rotating PECVD reactor can be used to prepare single-layer or multi-layer thin films on substrate particles of various materials with different shapes by using various gas/liquid precursors. The current development of the rotating PECVD process for particle coating of high quality is discussed, along with simulation and experimental results, in the present review. Flexibility in changing the process variables of rotating PECVD enables this process to be considered as a promising method for particle coating with possible applications in many different fields.
| Original language | English |
|---|---|
| Pages (from-to) | 29866-29875 |
| Number of pages | 10 |
| Journal | RSC Advances |
| Volume | 4 |
| Issue number | 56 |
| DOIs | |
| Publication status | Published - 2014 |
| Externally published | Yes |
ASJC Scopus subject areas
- Chemistry(all)
- Chemical Engineering(all)