"multipoint Force Feedback" Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography

Hanaul Noh, Goo Eun Jung, Sukhyun Kim, Seong Hun Yun, Ahjin Jo, Se Jong Kahng, Nam Joon Cho, Sang Joon Cho

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

Nanoscale patterning with massively parallel 2D array tips is of significant interest in scanning probe lithography. A challenging task for tip-based large area nanolithography is maintaining parallel tip arrays at the same contact point with a sample substrate in order to pattern a uniform array. Here, polymer pen lithography is demonstrated with a novel leveling method to account for the magnitude and direction of the total applied force of tip arrays by a multipoint force sensing structure integrated into the tip holder. This high-precision approach results in a 0.001 slope of feature edge length variation over 1 cm wide tip arrays. The position sensitive leveling operates in a fully automated manner and is applicable to recently developed scanning probe lithography techniques of various kinds which can enable "desktop nanofabrication." High precision leveling for polymer pen lithography is demonstrated with a 0.001 slope of feature edge length variation over 1 cm wide tip arrays. The approach employs a multipoint force sensing structure in order to take into account the magnitude and direction of the total applied force of the tip array.

Original languageEnglish
Pages (from-to)4526-4531
Number of pages6
JournalSmall
Volume11
Issue number35
DOIs
Publication statusPublished - 2015 Sept 1

Bibliographical note

Funding Information:
H. Noh and G.‐E. Jung contributed equally to this work. This work was supported by the National Research Foundation (NRF‐NRFF2011–01), and the National Medical Research Council (NMRC/CBRG/0005/2012) to N.J.C. This work was also supported in part by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning (Grant No. 2013R1A1A2011526) and Advanced Technology Center (ATC) Program funded by the Ministry of Trade, Industry & Energy (Grant No. 10045812) to S.‐J.C.

Publisher Copyright:
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Keywords

  • dip pen nanolithography
  • leveling
  • lithography
  • polymer pen lithography
  • scanning probe lithography
  • tip arrays

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • General Chemistry
  • General Materials Science
  • Biotechnology
  • Biomaterials

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