@inproceedings{1539c1ff29d8440eaf89ea322b9bbc7f,
title = "Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template",
abstract = "Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.",
keywords = "Mirror image pattern, Nano-imprint lithography, Nano-pattern duplication, Poly(vinyl alcohol), Thermally curable monomer, Water soluble stamp",
author = "H. Lee and Yang, {K. Y.} and S. Hong and Schaper, {C. D.} and Jung, {G. Y.}",
year = "2007",
doi = "10.4028/3-908451-30-2.661",
language = "English",
isbn = "3908451302",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
number = "PART 1",
pages = "661--664",
booktitle = "Nanoscience and Technology",
edition = "PART 1",
note = "China International Conference on Nanoscience and Technology, ChinaNANO 2005 ; Conference date: 09-06-2005 Through 11-06-2005",
}