TY - GEN
T1 - Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template
AU - Lee, H.
AU - Yang, K. Y.
AU - Hong, S.
AU - Schaper, C. D.
AU - Jung, G. Y.
PY - 2007
Y1 - 2007
N2 - Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.
AB - Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.
KW - Mirror image pattern
KW - Nano-imprint lithography
KW - Nano-pattern duplication
KW - Poly(vinyl alcohol)
KW - Thermally curable monomer
KW - Water soluble stamp
UR - http://www.scopus.com/inward/record.url?scp=38549113575&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=38549113575&partnerID=8YFLogxK
U2 - 10.4028/3-908451-30-2.661
DO - 10.4028/3-908451-30-2.661
M3 - Conference contribution
AN - SCOPUS:38549113575
SN - 3908451302
SN - 9783908451303
T3 - Solid State Phenomena
SP - 661
EP - 664
BT - Nanoscience and Technology
PB - Trans Tech Publications Ltd
T2 - China International Conference on Nanoscience and Technology, ChinaNANO 2005
Y2 - 9 June 2005 through 11 June 2005
ER -