Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template

H. Lee, K. Y. Yang, S. Hong, C. D. Schaper, G. Y. Jung

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    3 Citations (Scopus)

    Abstract

    Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

    Original languageEnglish
    Title of host publicationNanoscience and Technology
    PublisherTrans Tech Publications Ltd
    Pages661-664
    Number of pages4
    EditionPART 1
    ISBN (Print)3908451302, 9783908451303
    DOIs
    Publication statusPublished - 2007
    EventChina International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China
    Duration: 2005 Jun 92005 Jun 11

    Publication series

    NameSolid State Phenomena
    NumberPART 1
    Volume121-123
    ISSN (Print)1012-0394

    Other

    OtherChina International Conference on Nanoscience and Technology, ChinaNANO 2005
    Country/TerritoryChina
    CityBeijing
    Period05/6/905/6/11

    Keywords

    • Mirror image pattern
    • Nano-imprint lithography
    • Nano-pattern duplication
    • Poly(vinyl alcohol)
    • Thermally curable monomer
    • Water soluble stamp

    ASJC Scopus subject areas

    • Atomic and Molecular Physics, and Optics
    • General Materials Science
    • Condensed Matter Physics

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