Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template

H. Lee, K. Y. Yang, S. Hong, C. D. Schaper, G. Y. Jung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

Original languageEnglish
Title of host publicationNanoscience and Technology
PublisherTrans Tech Publications Ltd
Pages661-664
Number of pages4
EditionPART 1
ISBN (Print)3908451302, 9783908451303
DOIs
Publication statusPublished - 2007
EventChina International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China
Duration: 2005 Jun 92005 Jun 11

Publication series

NameSolid State Phenomena
NumberPART 1
Volume121-123
ISSN (Print)1012-0394

Other

OtherChina International Conference on Nanoscience and Technology, ChinaNANO 2005
Country/TerritoryChina
CityBeijing
Period05/6/905/6/11

Keywords

  • Mirror image pattern
  • Nano-imprint lithography
  • Nano-pattern duplication
  • Poly(vinyl alcohol)
  • Thermally curable monomer
  • Water soluble stamp

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

Fingerprint

Dive into the research topics of 'Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template'. Together they form a unique fingerprint.

Cite this