Abstract
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials used as the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nanophotonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.
Original language | English |
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Pages (from-to) | 1521-1532 |
Number of pages | 12 |
Journal | Journal of Nanoscience and Nanotechnology |
Volume | 14 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2014 Feb |
Keywords
- Anti-Reflectors
- Color Filters
- Laser Interference Lithography
- Optical Devices
- Reflectors
ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Biomedical Engineering
- Materials Science(all)
- Condensed Matter Physics