Nanopatterning by laser interference lithography: Applications to optical devices

Jung Hun Seo, Jung Ho Park, Seong Il Kim, Bang Ju Park, Zhenqiang Ma, Jinnil Choi, Byeong Kwon Ju

Research output: Contribution to journalReview articlepeer-review

103 Citations (Scopus)


A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials used as the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nanophotonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.

Original languageEnglish
Pages (from-to)1521-1532
Number of pages12
JournalJournal of Nanoscience and Nanotechnology
Issue number2
Publication statusPublished - 2014 Feb


  • Anti-Reflectors
  • Color Filters
  • Laser Interference Lithography
  • Optical Devices
  • Reflectors

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics


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