Nanopatterning of thin polymer films by controlled dewetting on a topographic pre-pattern

We develop a non-lithographic method for fabricating ordered micro/nanostructures of polymer thin films based on controlled dewetting of the films on topographically pre-patterned substrates with a large area. An ordered nanopattern of polystyrene (PS) is accomplished by thermal treatment of a thin PS film above its T_g spin coated on a topographically patterned substrate. We investigate the influence of pattern geometry on the final morphology of the dewetted polymer films using both mesa and indent patterned substrates. The controlled dewetting, initiated preferentially at the edges of individual pre-patterned mesas, in particular gives rise to spherical cap domains located at the center of the mesas. The domains are much smaller than the individual mesas as a consequence of the significant pattern reduction to nearly 300%. The arrays of 70 nm PS nano-sphere caps are obtained from arrays of 200 nm square pre-patterned mesas. Our method is also applicable for other polymers such as a poly(4-vinyl pyridine) (P4VP) containing Rhodamine 6G (Rh6G) dye on a pre-patterned PS substrate and successfully produced highly fluorescent stable nanopatterned films.