Nanostructured polycarbonate for robust transparency and anti-fogging by control of self-masking metallic clusters

  • Sun Mi Yoon
  • , Hyunji Lee
  • , Hyebin Lee
  • , Sahn Nahm
  • , Myoung Woon Moon*
  • *Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    High-aspect-ratio nanostructures formed on a transparent polymer can be easily damaged after several cycles of anti-fogging testing, resulting in a reduction in optical transmittance. To ensure the robust wetting and optical properties of the transparent polycarbonate, we controlled the nanostructure geometries by adding the inert argon gas to oxygen gas during plasma-based selective ion etching process, resulting in both better transparency and longer-lasting anti-fogging properties. We confirmed that the size of the metallic clusters as a self-etching mask is strongly related to the aspect ratio of the final nanostructures. Since metallic clusters with relatively large diameters were formed with the addition of argon gas to oxygen gas, the robustness of the polycarbonate wettability and transparency instilled by the robust nanostructures was improved, as indicated by cyclic anti-fogging testing.

    Original languageEnglish
    Pages (from-to)4697-4706
    Number of pages10
    JournalResearch on Chemical Intermediates
    Volume44
    Issue number8
    DOIs
    Publication statusPublished - 2018 Aug 1

    Bibliographical note

    Funding Information:
    Acknowledgements This research was supported by a Korea Institute of Science and Technology (KIST) internal project. The authors also acknowledge support by a grant [KCG-01-2017-02] through the Disaster and Safety Management Institute funded by Korea Coast Guard of the Korean government.

    Publisher Copyright:
    © 2018, Springer Science+Business Media B.V., part of Springer Nature.

    Keywords

    • Anti-fogging
    • Nanoclusters
    • Self-mask
    • Superhydrophilic surfaces
    • Transmittance

    ASJC Scopus subject areas

    • General Chemistry

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