Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.
Bibliographical noteFunding Information:
This work was supported by LG Display under LGD-Yonsei University Incubation Program, the National Research Foundation of Korea (NRF) grant funded by the Korean government (NRF-2018M3D1A1058793, 2015R1A5A1037668, 2016M3A7B4910798) and grants from the Institute for Basic Science (IBS-R026-D1). J.L. and H.C. were supported by the National Research Foundation of Korea (NRF) through the government of Korea (MSIP) (Grant NRF-2018R1A2A1A05079060). H.-G.P. acknowledges support from National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIT) (grant no. 2018R1A3A3000666).
© 2020, The Author(s).
ASJC Scopus subject areas
- Biochemistry, Genetics and Molecular Biology(all)
- Physics and Astronomy(all)