NO and SO₂ removal in non-thermal plasma reactor packed with glass beads-TiO₂ thin film coated by PCVD process

We analyzed the NO and SO₂ removal in the non-thermal plasma discharge process combined with TiO₂ photocatalyst. The non-thermal plasmas were generated by dielectric barrier discharge with glass beads as dielectric materials. The TiO₂ thin films were coated on the glass beads uniformly without crack by a rotating cylindrical plasma chemical vapor deposition reactor. The NO and SO₂ removal efficiencies obtained in non-thermal plasma-TiO₂ photocatalysts hybrid system were higher than those in plasma process only, because of the additional removal of NO and SO₂ by photocatalysts. The NO and SO₂ removal efficiencies become higher, as applied peak voltage, pulse frequency and gas residence time increase, or as the initial NO and SO₂ concentrations decrease. The hybrid system of non-thermal plasma and photocatalyst thin film on glass beads prepared by PCVD process is quite efficient method to remove NO and SO₂.