Nonsymmetrical Modified Chemical Vapor Deposition (N-MCVD) Process

Juraj Doupovec, Alexander L. Yarin

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)


A new, simple fabrication method of circularly and axially nonsymmetrical MCVD layers has been proposed. Thermophoretic mechanism was regulated by means of two linear heaters and coolers, respectively, which change the circular symmetry of thermophoretic deposition mechanism of standard MCVD process. Furthermore, a theoretical description of thermophoretic deposition mechanism inside the substrate tube in some simplified conditions is given.

Original languageEnglish
Pages (from-to)695-700
Number of pages6
JournalJournal of Lightwave Technology
Issue number6
Publication statusPublished - 1991 Jun

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics


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