Nonsymmetrical Modified Chemical Vapor Deposition (N-MCVD) Process

Juraj Doupovec; Alexander L. Yarin

doi:10.1109/50.81970

Nonsymmetrical Modified Chemical Vapor Deposition (N-MCVD) Process

Juraj Doupovec, Alexander L. Yarin

College of Engineering

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

A new, simple fabrication method of circularly and axially nonsymmetrical MCVD layers has been proposed. Thermophoretic mechanism was regulated by means of two linear heaters and coolers, respectively, which change the circular symmetry of thermophoretic deposition mechanism of standard MCVD process. Furthermore, a theoretical description of thermophoretic deposition mechanism inside the substrate tube in some simplified conditions is given.

Original language	English
Pages (from-to)	695-700
Number of pages	6
Journal	Journal of Lightwave Technology
Volume	9
Issue number	6
DOIs	https://doi.org/10.1109/50.81970
Publication status	Published - 1991 Jun

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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abstract = "A new, simple fabrication method of circularly and axially nonsymmetrical MCVD layers has been proposed. Thermophoretic mechanism was regulated by means of two linear heaters and coolers, respectively, which change the circular symmetry of thermophoretic deposition mechanism of standard MCVD process. Furthermore, a theoretical description of thermophoretic deposition mechanism inside the substrate tube in some simplified conditions is given.",

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AB - A new, simple fabrication method of circularly and axially nonsymmetrical MCVD layers has been proposed. Thermophoretic mechanism was regulated by means of two linear heaters and coolers, respectively, which change the circular symmetry of thermophoretic deposition mechanism of standard MCVD process. Furthermore, a theoretical description of thermophoretic deposition mechanism inside the substrate tube in some simplified conditions is given.

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Nonsymmetrical Modified Chemical Vapor Deposition (N-MCVD) Process

Abstract

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