Novel Conductive Filament Metal-Interlayer-Semiconductor Contact Structure for Ultralow Contact Resistance Achievement

Keyphrases

• Metal-semiconductor-metal 100%
• Contact Resistance 100%
• Conductive Filament 100%
• Ultra-low 100%
• Contact Structure 100%
• Semiconductor Contacts 100%
• Ohmic Contact 60%
• Schottky Barrier Height 40%
• Semiconductors 20%
• Nanodevices 20%
• Specific Contact Resistivity 20%
• Complementary Metal Oxide Semiconductor 20%
• Metal-semiconductor Contact 20%
• Lieu 20%
• Electronic Nanodevices 20%
• Physical Limits 20%
• Contact Scheme 20%
• Complementary Metal-oxide-semiconductor Technology 20%
• Innovative Technique 20%
• Post-Moore Era 20%

Material Science

• Contact Resistance 100%
• Schottky Barrier 50%
• Complementary Metal-Oxide-Semiconductor Device 50%
• Nanodevice 50%
• Electrical Resistivity 25%