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Novel Conductive Filament Metal-Interlayer-Semiconductor Contact Structure for Ultralow Contact Resistance Achievement
Seung Hwan Kim
, Gwang Sik Kim
, June Park
, Changmin Lee
, Hyoungsub Kim
, Jiyoung Kim
,
Joon Hyung Shim
,
Hyun Yong Yu
*
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Article
›
peer-review
11
Citations (Scopus)
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Keyphrases
Metal-semiconductor-metal
100%
Contact Resistance
100%
Conductive Filament
100%
Ultra-low
100%
Contact Structure
100%
Semiconductor Contacts
100%
Ohmic Contact
60%
Schottky Barrier Height
40%
Semiconductors
20%
Nanodevices
20%
Specific Contact Resistivity
20%
Complementary Metal Oxide Semiconductor
20%
Metal-semiconductor Contact
20%
Lieu
20%
Electronic Nanodevices
20%
Physical Limits
20%
Contact Scheme
20%
Complementary Metal-oxide-semiconductor Technology
20%
Innovative Technique
20%
Post-Moore Era
20%
Material Science
Contact Resistance
100%
Schottky Barrier
50%
Complementary Metal-Oxide-Semiconductor Device
50%
Nanodevice
50%
Electrical Resistivity
25%