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Novel fabrication technique for nanoscale hydrogen silsesquioxane structures using a direct printing technique

  • Ki Yeon Yang
  • , Sang Chul Oh
  • , Hyungwon Park
  • , Heon Lee*
  • *Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Hydrogen silsesquioxane (HSQ), a type of spin-on glass, is an attractive material for nanobio, semiconductor and photoelectronic applications because it can be transformed into SiO2 by a simple annealing process. Studies on the fabrication of nanosized structures are necessary for the simple and easy production of HSQ nanostructures because of their unique characteristics. In this study, a fabrication method was developed for HSQ nanostructures as small as 50 nm using a direct printing technique with a poly (dimethylsiloxane) (PDMS) mold. Using this technique, HSQ nanostructures can be fabricated on a curved substrate

    Original languageEnglish
    Article number051602
    JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
    Volume29
    Issue number5
    DOIs
    Publication statusPublished - 2011 Sept

    Bibliographical note

    Funding Information:
    This work was supported by the Nano R&D program through the Korea Science and Engineering Foundation funded by the Ministry of Education, Science and Technology (2010-0019152) and Korea Industrial Technology Foundation (KOTEF) through the Human Resource Training Project for Strategic Technology.

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Instrumentation
    • Process Chemistry and Technology
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering
    • Materials Chemistry

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