Novel hybrid mask mold for combined nanoimprint and photolithography technique

Kanghun Moon, Banglim Choi, In Sung Park, Sunghun Hong, Kihyun Yang, Heon Lee, Jinho Ahn

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask mold with SiO2 interlayer and hydrophobic agent treatment is suggested for easy detachment after imprinting. This allows a very simple process to get a complete pattern transfer without any defects.

Original languageEnglish
Pages (from-to)889-892
Number of pages4
JournalMicroelectronic Engineering
Issue number4-9 SPEC. ISS.
Publication statusPublished - 2006 Apr

Bibliographical note

Funding Information:
This work was supported by the research fund of Hanyang University (HY-2004-S) and the KOSEF through Quantum Photonic Science Research Center.


  • Anti-sticking property
  • Hybrid mask mold
  • Nanoimprint lithography
  • Photolithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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